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Target Bonding Service

Introduction to the bonding method and process of sputtering target materials

Sputtering target material is a physical vapor deposition technique. It is the process in which ions generated by an ion source accelerate and aggregate in vacuum to form a high-speed ion beam, bombarding the solid surface. The ions exchange kinetic energy with the atoms on the solid surface, causing the atoms on the solid surface to leave the solid and deposit on the substrate surface. The integrity and combination rate of target material and backboard bonding can determine the performance and cost of the target material, so the requirements for target material bonding are relatively high. So how should we bind it? Below, Kejin Ultrasonic Equipment Factory will introduce the bonding method and process of target materials.

The main bonding modes of the target material

Target Bonding Process

In addition to maintaining the accidental rupture of the target material during transportation, it can also improve some of the problems of the lack of mechanical strength of the target material. These are all solved by using the target material to be spliced onto the back plate to solve the problem of limited large-scale target material preparation and application. It can ensure excellent cooling and electrical touch of the target material, preventing uneven sputtering and cracking of the target material during sputtering.

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Notes on the use of bound target materials

Uneven thermal conductivity can cause uneven sputtering of the target material (uneven film formation), as well as surface nodulation and discharge phenomena, which can cause uneven film formation. The color of the film layer shows differences, and the differences in the three silver products that affect the change of the dielectric layer are more significant, leading to an increase in the scrap rate of the coating. Therefore, the bonding quality of the target material has a significant impact on its application. In general, because the target material generates a large amount of heat during the sputtering process, but the heat dissipation of ceramic targets is relatively poor. If the bonding shows a large area with poor bonding, it is easy to show local heat accumulation during the sputtering process, and low melting point bonding data indium melts, leading to cracking or even falling of the target material.

The role of target material bonding

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